Method of manufacturing assembly for plasma reaction chamber and use thereof
US6376385B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 23, 2001 |
| Grant date | Apr 23, 2002 |
| Priority date | — |
| Expiry date | Feb 23, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32532
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electrode assembly for a plasma reaction chamber wherein processing of a semiconductor substrate such as a single wafer can be carried out, a method of manufacture of the electrode assembly and a method of processing a semiconductor substrate with the assembly. The electrode assembly includes a support member such as a graphite ring, an electrode such as a silicon showerhead electrode in the form of a circular disk of uniform thickness and an elastomeric joint between the support member and the electrode. The elastomeric joint allows movement between the support member and the electrode to compensate for thermal expansion as a result of temperature cycling of the electrode assembly. The elastomeric joint can include an electrically and/or thermally conductive filler and the elastomer can be a catalyst-cured polymer which is stable at high temperatures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.