Developing method and developing apparatus
US6382849B1 · kind B1 · utility
25Cited by
12References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 8, 2000 |
| Grant date | May 7, 2002 |
| Priority date | — |
| Expiry date | Jun 8, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03D5/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a developing processing to apply the developing solution onto the substrate after the light exposure, a developing solution supply nozzle scans a substrate more than once while discharging the developing solution on the substrate in a band shape to coat the substrate with the developing solution. Thus, it is possible to perform a developing processing with a small variation and high uniformity of the line width.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.