Lithographic projection apparatus
US6384899B1 · kind B1 · utility
61Cited by
11References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 2, 2000 |
| Grant date | May 7, 2002 |
| Priority date | — |
| Expiry date | Feb 2, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7069
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In an interferometric alignment system provides an alignment signal for reproducibly registering a reticle 10 with a wafer 12. The radiation from a laser 50, which is the illumination source for the interferometer, is modulated by a phase modulator 52 to eliminate spurious noise from the alignment signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.