Cleaning apparatus
US6386466B1 · kind B1 · utility
65Cited by
7References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 11, 2000 |
| Grant date | May 14, 2002 |
| Priority date | — |
| Expiry date | Apr 11, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67092
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A cleaning apparatus includes a nozzle having an ejection port, a cleaning liquid path communicating with the ejection port, and a compressed gas path communicating with the ejection port. The cleaning apparatus further includes a cleaning liquid feeding component for feeding a cleaning liquid to the cleaning liquid path, and a compressed gas feeding component for feeding a compressed gas to the compressed gas path. The compressed gas is ejected from the ejection port through the compressed gas path, while the cleaning liquid is ejected from the ejection port through the cleaning liquid path.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.