Patent · US Expired

Method and device for producing extreme ultraviolet and soft X-rays from a gaseous discharge

US6389106B1 · kind B1 · utility

9Cited by
3References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 28, 2000
Grant dateMay 14, 2002
Priority date
Expiry dateJul 28, 2020

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05H1/48
  • WIPO fieldMedical technology
  • WIPO sectorInstruments

Abstract

A method and a device for generating extreme ultraviolet (EUV) and soft x-ray radiation from a gas discharge. The device has at least two electrodes each having a flush opening by which an axis of symmetry is defined, in which an intermediate space with a wide spatial homogenous gas filling between anode and cathode is provided. The electrodes are formed in such a way, that the gas discharge is formed exclusively in the volume defined by the flush openings. The current pulses with respect to amplitude and period duration are selected in such a way that a dense hot plasma channel is formed on the axis of symmetry, the plasma being the source of EUV and/or soft x-ray radiation. The preferred area of application is the EUV projection lithography in the spectral range around 13 nm.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.