Retainers and non-abrasive liners used in chemical mechanical polishing
US6390904B1 · kind B1 · utility
46Cited by
6References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 21, 1998 |
| Grant date | May 21, 2002 |
| Priority date | — |
| Expiry date | May 21, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/30625
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The present invention provides a retaining ring having an resilient liner for protecting the substrate edge from being damaged during chemical mechanical polishing and a method for making the same. Retainers made of wear resistant ceramics, such as alumina, provide better overall performance, including wear resistance, and reduced particle formation than other retaining ring materials. By incorporating a resilient liner, such as an epoxy, on the inner surface of the wear resistant ring, the substrate edge is protected from damage that can be easily caused by the hard surface of the ceramic alone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.