Polymers and photoresist compositions using the same
US6391518B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 23, 1999 |
| Grant date | May 21, 2002 |
| Priority date | — |
| Expiry date | Jul 23, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0395
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a photoresist monomer represented by the following formula 2; a photoresist copolymer represented by the following formula 100; and a photoresist composition containing the same. wherein, R1 and R2 are independently —COOH or —R—COOH; and R is a substituted or unsubstituted (C1-C10) alkyl. wherein, R1 and R2 are independently —COOH or —R—COOH ; R is a substituted or unsubstituted (C1-C10) alkyl; R3 is —COOR* or —R′COOR*; R* is an acid labile group; R′ is a substituted or unsubstituted (C1-C10) alkyl; R4 is H or R3; R5 is a substituted or unsubstituted (C1-C10) alkyl; and a:b:c is the polymerization ratio of the comonomer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.