Control technique for microlithography lasers
US6392743B1 · kind B1 · utility
33Cited by
5References
7Claims
0Family size
Assignee
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Key dates
| Filing date | Feb 29, 2000 |
| Grant date | May 21, 2002 |
| Priority date | — |
| Expiry date | Feb 29, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/1305
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithograph quality optimization process for controlling laser beam parameters when changing operating modes. The laser is programmed to automatically conduct an optimization procedure preferably in less than one minute to adjust laser operating parameters such as blower speed, total gas pressure and F2 partial pressure in order to optimize beam quality parameters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.