Patent · US Expired

Method and apparatus to place wafers into and out of machine

US6398631B1 · kind B1 · utility

1Cited by
14References
29Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 2, 2001
Grant dateJun 4, 2002
Priority date
Expiry dateFeb 2, 2021

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67745
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A system for facilitating transfer of a semiconductor wafer into or out of a wafer carrier of a polishing or lapping machine without contacting a face of the wafer. The system includes a wafer transport suitable for placement above the carrier, the transport having at least one open cavity with a size and shape suitable for registering alignment with an opening of the carrier. The cavity and opening together form a compartment adapted to receive and hold the wafer. A liquid delivery conduit having an outlet located above an abrading member of the machine is arranged to deliver a liquid to a position generally beneath the transport. A method for transferring the wafer to or from the machine includes delivering liquid beneath the wafer. The wafer thereby moves between a first position resting on the abrading member and a second position spaced above the abrading member where a tool may engage the edge of the wafer for holding the wafer without contacting the face of the wafer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.