Simplified ozonator for a semiconductor wafer cleaner
US6399022B1 · kind B1 · utility
328Cited by
32References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 15, 2000 |
| Grant date | Jun 4, 2002 |
| Priority date | — |
| Expiry date | Sep 15, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldEnvironmental technology
- WIPO sectorChemistry
Abstract
The invention provides water enriched with ozone by generating ozone from oxygen using short-wavelength ultraviolet light and pumping the generated ozone under pressure through a 0.1-micron filter into a sealed housing of deionized water. The filter is fabricated of a material such as polytetrafluoroethylene which does not react with water and ozone. The filter apertures are sufficiently small to prevent the formation of gas bubbles in the outlet fluid. The highly-purified outlet fluid is usable immediately in semiconductor wafer cleaning.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.