Pattern generator with improved precision
US6399261B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 29, 2000 |
| Grant date | Jun 4, 2002 |
| Priority date | — |
| Expiry date | Aug 29, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N2201/0414
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
The present invention relates to a method for creating a pattern on a workpiece with better pattern fidelity and dimensional precision. The method comprises the steps of: providing a source for emitting electromagnetic radiation, illuminating by said radiation a spatial light modulator (SLM) having a multitude of pixels, projecting an image of the modulator on the workpiece, moving said workpiece and/or projection system relative to each other, reading from an information storage device a digital description of the pattern to be written, extracting from the pattern description a sequence of partial patterns, converting said partial patterns to modulator signals, and feeding said signals to the modulator, further coordinating the workpiece, the modulator and the radiation source, so that said pattern is stitched together from the partial images, further exposing said pattern in at least two separate exposures, where at one exposure corrections are applied for errors occurring during another exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.