Water-processable photoresist compositions
US6399273B1 · kind B1 · utility
26Cited by
8References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 14, 2000 |
| Grant date | Jun 4, 2002 |
| Priority date | — |
| Expiry date | Aug 14, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Water-processable positive-tone photoresists comprising a water-soluble polymer, wherein the polymer contains a heat-labile functional group that renders the polymer insoluble in water or an aqueous base upon heat treatment, and an acid-labile functional group that restores said water or aqueous base solubility to the polymer upon irradiation in the presence of a water-processable photoacid generator, are described. Also described are the methods of making such polymers and photoresists.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.