Developing method and developing apparatus
US6402399B2 · kind B2 · utility
14Cited by
6References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 18, 2001 |
| Grant date | Jun 11, 2002 |
| Priority date | — |
| Expiry date | Apr 18, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/3021
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A developing method comprising, a step of holding a substrate in substantially a horizontal position, the substrate coated with a photoresist film which has a pattern-exposed region where a predetermined circuit pattern is formed by light exposure, and a step of developing the photoresist film by starting to apply, at a time, a developing solution to the entire pattern-exposed region of the photoresist film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.