Apparatus for pumping out transfer chambers for transferring semiconductor equipment
US6402479B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 12, 2000 |
| Grant date | Jun 11, 2002 |
| Priority date | — |
| Expiry date | Jul 12, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4412
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In the invention, the gases present in a transfer chamber are pumped out by means of a primary pump that is driven by variable-speed drive means, that is connected in series with a turbomolecular secondary pump, and that is associated with gas monitoring means for monitoring one or more appropriate characteristic parameters of the pumped gases and for producing control signals acting on the drive means of the primary pump so as to adapt its pumping speed in order to avoid any condensation or solidification of the gases in the airlock or transfer chamber. It is thus possible to optimize the speed at which the pressure is lowered, and to reduce the pollution brought into the process chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.