Diamond film deposition on substrate arrays
US6406760B1 · kind B1 · utility
11Cited by
36References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 18, 2000 |
| Grant date | Jun 18, 2002 |
| Priority date | — |
| Expiry date | Jul 18, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4582
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method is disclosed for depositing diamond film on a plurality of substrates, which comprises the steps of: providing a plasma beam containing atomic hydrogen and a carbonaceous component; providing a plurality of substrates, each of the substrates having a deposited surface, the substrates being arranged such that the beam impinges successively on a deposition surface of a first substrate and then on a deposition surface of a second substrate, the deposition surfaces of the first and second substrates being oriented with respect to each other at a non-zero angle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.