Patent · US Expired

Physical design technique providing single and multiple core microprocessor chips in a single design cycle and manufacturing lot using shared mask sets

US6406980B1 · kind B1 · utility

3Cited by
1References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 24, 2000
Grant dateJun 18, 2002
Priority date
Expiry dateDec 13, 2020

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D84/90

Abstract

A wafer design layout and method of producing multiple integrated chip types using a single set of masks for a wafer and then at the time the type of chip desired is known, using a few customizing steps to produce the final integrated chip is provided. In one embodiment, the wafer layout includes a plurality of groupings of components and a plurality of dicing channels separating each of the components from others of the components. After the particular type of integrated circuit chip desired is selected, the wafer may then have the final few layers processed and the chips removed using the appropriate dicing channels for the integrated circuit chip desired.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.