Apparatus for the examining defect of monolithic substrate and method for examining the same
US6407404B1 · kind B1 · utility
2Cited by
2References
16Claims
0Family size
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Key dates
| Filing date | Mar 15, 2000 |
| Grant date | Jun 18, 2002 |
| Priority date | — |
| Expiry date | Mar 15, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/956
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus inputs an image of a regularly latticed-patterns. The inputted image data is transformed into frequency data by the Fourier transformation. The frequency data is restored into image data after it is processed. The processing of the frequency data includes a process for removing a frequency component corresponding to the latticed patterns. The processing of the frequency data further includes a process for removing a frequency component corresponding to a shape of an area of the latticed patterns. The processed data is used for detecting and examining a defect. It is possible to examine a defect accurately.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.