Optical inspection system and method
US6407809B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 10, 2000 |
| Grant date | Jun 18, 2002 |
| Priority date | — |
| Expiry date | Feb 10, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/0635
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical inspection system is presented, aimed at detecting defects on a substantially flat workpiece having an axis of symmetry. The workpiece is supported on a stage so as to be in an inspection plane, the stage being mounted for rotation in a plane parallel to the inspection plane. A scanning apparatus is accommodated above the workpiece, and comprises an illumination assembly, a plurality of optical assemblies, and a plurality of area sensors. The illumination assembly produces a plurality of incident radiation components for illuminating a strip on the workpiece extending parallel to the axis symmetry between two opposite sides thereof. The optical assemblies are aligned along the axis of symmetry in a spaced-apart parallel relationship, and are mounted for reciprocating movement within a plane parallel to an inspection area that covers substantially a half of the workpiece. The area sensors are arranged in a predetermined manner, each area sensor being associated with a corresponding one of the optical assemblies for receiving a component of returned radiation and generating data representative thereof. The half of the workpiece is strip-by-strip inspected, then the stage w…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.