NOVA MEASURING INSTRUMENTS INC.
186Patents
116Active
186Granted
52Portfolio score
Filing activity: Apr 1, 1994 → May 17, 2024 · 28 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5604344A | Autofocussing microscope having a pattern imaging system | Physics | 141 | Expired |
| US5517312A | Device for measuring the thickness of thin films | Physics | 112 | Expired |
| US6657736B1 | Method and system for measuring patterned structures | Physics | 100 | Expired |
| US6476920B1 | Method and apparatus for measurements of patterned structures | Electricity | 100 | Expired |
| US6166801A | Monitoring apparatus and method particularly useful in photolithographically processing substrates | Emerging Cross-Sectional Technologies | 94 | Expired |
| US5764365A | Two-dimensional beam deflector | Physics | 77 | Expired |
| US5682242A | Method and apparatus for determining a location on a surface of an object | Physics | 73 | Expired |
| US6100985A | Method and apparatus for measurements of patterned structures | Electricity | 70 | Expired |
| US6974962B2 | Lateral shift measurement using an optical technique | Electricity | 70 | Expired |
| US6045433A | Apparatus for optical inspection of wafers during polishing | Electricity | 66 | Expired |
| US6704920B2 | Process control for micro-lithography | Electricity | 61 | Expired |
| US6038029A | Method and apparatus for alignment of a wafer | Physics | 54 | Expired |
| US5867590A | Method and apparatus for determining a location on a surface of an object | Physics | 54 | Expired |
| US6556947B1 | Optical measurements of patterned structures | Electricity | 49 | Expired |
| US6426502B1 | Apparatus for integrated monitoring of wafers and for process control in the semiconductor manufacturing and a method for use thereof | Electricity | 39 | Expired |
| US6281974A | Method and apparatus for measurements of patterned structures | Electricity | 39 | Expired |
| US6212961A | Buffer system for a wafer handling system | Electricity | 37 | Expired |
| US6424417B1 | Method and system for controlling the photolithography process | Physics | 36 | Expired |
| US6650424B2 | Method and system for measuring in patterned structures | Electricity | 27 | Expired |
| US6292265A | Method and apparatus for monitoring a chemical mechanical planarization process applied to metal-based patterned objects | Electricity | 27 | Expired |
| US6603529B1 | Monitoring apparatus and method particularly useful in photolithographically processing substrates | Physics | 26 | Expired |
| US6815947B2 | Method and system for thickness measurements of thin conductive layers | Physics | 24 | Expired |
| US7292341B2 | Optical system operating with variable angle of incidence | Physics | 23 | Expired |
| US8142965B2 | Method and system for measuring in patterned structures | Physics | 22 | Active |
| US6407809B1 | Optical inspection system and method | Physics | 20 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.