Silane-based nanoporous silica thin films and precursors for making same
US6410149B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 23, 1999 |
| Grant date | Jun 25, 2002 |
| Priority date | — |
| Expiry date | Aug 23, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31663
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Improved processes for forming hydrophobic nanoporous dielectric coatings on substrates are provided. The improved processes involve forming a reaction mixture that combines at least one mono-, di- or trifunctional precursor with at least one tetrafunctional precursor, recovering the reaction product, and then depositing the reaction product onto a suitable substrate, followed by gelling of the deposited film. Precursors include alkoxy, acetoxy and halogen leaving groups. Optional processes to enhance the hydrophobicity of a nanoporous silica film are also provided, as well as improved nanoporous silica films, coated substrates and integrated circuits prepared by the new processes
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.