Methods utilizing antireflective coating compositions with exposure under 200 nm
US6410209B1 · kind B1 · utility
61Cited by
15References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 15, 1998 |
| Grant date | Jun 25, 2002 |
| Priority date | — |
| Expiry date | Sep 15, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.