Electron-electro-optical debug system E2ODS
US6411111B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 15, 2000 |
| Grant date | Jun 25, 2002 |
| Priority date | — |
| Expiry date | May 15, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/31705
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A testing system comprising an electron beam probe, a photon beam probe, and a device under test (DUT) card holder which is positioned between the electron beam probe and the photon beam probe. A first valve is positioned between the electron beam probe and the DUT. A second valve, located on an opposite side of the DUT from the first valve, is positioned between the photon beam probe and the DUT. The first and second valve operate in cooperation to control the pressure surrounding the DUT card. One embodiment of the invention includes a first test chamber and a second test chamber. The first test chamber includes the area between the first side of the DUT card and the first valve. The second test chamber includes the area between the second side of the DUT card and the second valve. The present invention includes a method for using the test system of the present invention to test both the top and bottom surfaces of a semiconductor device. The method for using the test system manipulates the first valve and the second valve to selectively contain a vacuum pressure throughout the first test chamber and the area surrounding the DUT. The present invention includes a method for prepari…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.