Method of forming bumps by electroplating
US6413404B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 11, 2000 |
| Grant date | Jul 2, 2002 |
| Priority date | — |
| Expiry date | Feb 11, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/3473
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Bumps are formed by means of uniform plating in which air can be easily discharged. A plating device comprises: a plating tank 32; a holding jig 34 detachably attached to an object 35 to be plated, the holding jig 34 being connected with a cathode and electrically connected with the object 35 to be plated, the object 35 to be plated being dipped in a plating solution, by the holding jig 34, substantially vertically or obliquely to the surface of the plating solution in the plating tank so that the surface to be plated can be directed upward; a cylindrical body 39 made of insulating material arranged in the front of the object 35 to be plated held by the holding jig 34 while a short clearance is left between the cylindrical body 39 and the surface to be plated and an axial line of the cylindrical body 39 is substantially perpendicular to the surface to be plated; an anode plate 37 arranged in the cylindrical body 39 being opposed to the surface of the object 35 to be plated; and a nozzle 40 arranged in the cylindrical body 39 while it penetrates the anode plate 37 and the plating solution is jetted onto the surface to be plated from the nozzle end section located in the cylindrical …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.