Lithographic projection apparatus
US6413701B1 · kind B1 · utility
24Cited by
1References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 9, 2000 |
| Grant date | Jul 2, 2002 |
| Priority date | — |
| Expiry date | Jul 26, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/707
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus includes, a radiation system for supplying a projection beam of radiation, a mask table provided with a mask holder for holding a mask, a substrate table provided with a substrate holder for holding a substrate, a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate, wherein the substrate holder has a supporting face for supporting a substrate and the supporting face is at least partially coated with a layer of electrically conductive material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.