Pattern size evaluation apparatus
US6423977B1 · kind B1 · utility
20Cited by
10References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 25, 1998 |
| Grant date | Jul 23, 2002 |
| Priority date | — |
| Expiry date | Feb 25, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/956
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A pattern size evaluation apparatus comprising an illumination optical system for projecting parallel light rays of a predetermined wavelength on a monitoring area formed on an object, the monitoring area being formed at a position different from a device pattern formed on the object, a light intensity detection optical system for detecting diffracted light from the monitoring area, and a device pattern size evaluation section for evaluating a size of the device pattern based on an intensity of diffracted light from the monitoring area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.