System and method to correct for distortion caused by bulk heating in a substrate
US6424879B1 · kind B1 · utility
19Cited by
6References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 13, 1999 |
| Grant date | Jul 23, 2002 |
| Priority date | — |
| Expiry date | Apr 13, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/30461
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
An electron beam writing system includes an electron beam patterning machine operable to emit an electron beam to form a pattern on a substrate. A computer control system, coupled to the electron beam patterning machine, has a plurality of pre-computed distortion maps. Each distortion map describes expected distortions of the substrate caused by bulk heating resulting from exposure to the electron beam. The computer control system controls the electron beam patterning machine using the distortion maps in order to adjust for the expected distortions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.