System and method for performing optical proximity correction on the interface between optical proximity corrected cells
US6425117B1 · kind B1 · utility
305Cited by
25References
18Claims
0Family size
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Key dates
| Filing date | Sep 29, 1997 |
| Grant date | Jul 23, 2002 |
| Priority date | — |
| Expiry date | Sep 29, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
The system and method performs optical proximity correction on an integrated circuit (IC) mask design by initially performing optical proximity correction on a library of cells that are used to create the IC. The pre-tested cells are imported onto a mask design. All cells are placed a minimum distance apart to ensure that no proximity effects will occur between elements fully integrated in different cells. A one-dimensional optical proximity correction technique is performed on the mask design by performing proximity correction only on those components, e.g., lines, that are not fully integrated within one cell.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.