Patent · US Expired

Single component developer for use with ghost exposure

US6426177B2 · kind B2 · utility

0Cited by

14References

6Claims

0Family size

Assignee

International Business Machines Corporation · US

Inventors

Thomas B. Faure · Saint Albans, US
Steven Flanders · Colchester, US
Lyndon S. Gibbs · Burlington, US
James P. Levin · Jericho, US
Harold G. Linde · South Burlington, US
Joseph L. Malenfant, Jr. · Colchester, US
Jeffrey F. Shepard · Vergennes, US

Key dates

Filing date	Dec 27, 2000
Grant date	Jul 30, 2002
Priority date	—
Expiry date	Dec 27, 2020

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/325
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for developing copolymer photosensitive resists wherein a single solvent is used in conjunction with a puddle develop tool. The copolymer resist is ZEP 7000 and the developer is ethyl 3-ethoxy propionate (EEP).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.