Method for pattern generation with improved image quality
US6428940B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 29, 2000 |
| Grant date | Aug 6, 2002 |
| Priority date | — |
| Expiry date | Aug 29, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N2201/0414
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
The present invention relates to a method for creating a microlithographic pattern on a workpiece, for increased resolution and image fidelity. The method comprises the steps of: providing a source for emitting electromagnetic radiation, illuminating by said radiation a spatial light modulator (SLM) having several pixels, projecting an image of the modulator on the workpiece, further coordinating the movement of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is stitched together from the partial images created by the sequence of partial patterns, where an area of the pattern is exposed at least twice with a change in at least one, and preferably at least two, of the following parameters between the exposures: data driven to the SLM, focus, angular distribution of the illumination at the SLM, pupil filtering, polarisation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.