Determination of center of focus by diffraction signature analysis
US6429930B1 · kind B1 · utility
52Cited by
19References
47Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 4, 2001 |
| Grant date | Aug 6, 2002 |
| Priority date | — |
| Expiry date | Sep 4, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70641
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides methods for determination of parameters in lithographic devices and applications by diffraction signature difference analysis, including determination of center of focus in lithography devices and applications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.