Process for formation of a coating on a substrate
US6432281B1 · kind B1 · utility
4Cited by
2References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 31, 2001 |
| Grant date | Aug 13, 2002 |
| Priority date | — |
| Expiry date | Jan 31, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/3428
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for forming a coating on a substrate by condensation of a coating material onto the substrate while the substrate is moving through an enclosure under vacuum in which evaporation of the coating material takes place.With the inventive process, deposits with controlled structure and adhesion can be made on moving substrate or support even at very high speeds, so that the process can advantageously be carried out continuously or at variable speed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.