Photoresist stripper composition and method for stripping photoresist using the same
US6432622B1 · kind B1 · utility
8Cited by
11References
12Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 6, 2000 |
| Grant date | Aug 13, 2002 |
| Priority date | — |
| Expiry date | Oct 6, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A photoresist stripper composition is formed of a mixture of acetone, &ggr;-butyrolactone, and ester solvent. A photoresist stripping method includes spraying the photoresist stripper composition over a substrate while rotating the substrate at a relatively low speed, so as to strip photoresist from the substrate. The rotation of the substrate is stopped for a short period of time, and thereafter the photoresist stripper composition is again sprayed over the substrate while rotating the substrate at a relatively high speed. Then, the substrate is rinsed with pure water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.