Pil-Kwon Jun
29Patents
7h-index
60Co-inventors
68Inventor score
Filing activity: Dec 20, 1996 → May 27, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5866305A | Thinner composition for washing a photoresist in a process for preparing semiconductors | Physics | 15 | Expired |
| US6100203A | Methods of employing aqueous cleaning compositions in manufacturing microelectronic devices | Electricity | 11 | Expired |
| US7951653B1 | Methods of manufacturing a semiconductor device using compositions for etching copper | Electricity | 9 | Active |
| US6883248B2 | Apparatus for drying a substrate using an isopropyl alcohol vapor | Electricity | 9 | Expired |
| US7311857B2 | Etching composition, method of preparing the same, method of etching an oxide film, and method of manufacturing a semiconductor device | Chemistry; Metallurgy | 8 | Expired |
| US6959823B2 | Wafer guides for processing semiconductor substrates | Emerging Cross-Sectional Technologies | 8 | Expired |
| US6432622B1 | Photoresist stripper composition and method for stripping photoresist using the same | Chemistry; Metallurgy | 8 | Expired |
| US6655042B2 | System and method for drying semiconductor substrate | Electricity | 6 | Expired |
| US6458518B1 | Photoresist stripper composition and method for stripping photoresist using the same | Chemistry; Metallurgy | 6 | Expired |
| US6207358A | Method of stripping a photoresist from a semiconductor substrate using dimethylacetamide or a combination of monoethanolamine and dimethylsulfoxide | Physics | 4 | Expired |
| US7183192B2 | Composition for removing photoresist and method of forming a bump electrode in a semiconductor device using the composition | Electricity | 3 | Expired |
| US7100306B2 | Wafer guides for processing semiconductor substrates | Emerging Cross-Sectional Technologies | 3 | Expired |
| US8455359B2 | Semiconductor devices and methods of manufacturing the same | Electricity | 3 | Active |
| US6337174B1 | Method of stripping a photoresist from a semiconductor substrate dimethylacetamide or a combination of monoethanolamine and dimethylsulfoxide | Physics | 2 | Expired |
| US7985297B2 | Method of cleaning a quartz part | Chemistry; Metallurgy | 2 | Active |
| US6713440B2 | Resist and etching by-product removing composition and resist removing method using the same | Chemistry; Metallurgy | 2 | Expired |
| US7037852B2 | Composition for stripping photoresist and method of preparing the same | Electricity | 1 | Expired |
| US6905570B2 | Apparatus for manufacturing integrated circuit device | Electricity | 1 | Expired |
| US7879736B2 | Composition for etching silicon oxide and method of forming a contact hole using the same | Electricity | 1 | Active |
| US7811836B2 | Methods of manufacturing reference sample substrates for analyzing metal contamination levels | Emerging Cross-Sectional Technologies | 1 | Active |
| US9528949B2 | Methods of detecting inhomogeneity of a layer and apparatus for performing the same | Physics | 1 | Active |
| US9638609B2 | Apparatus for providing sample gas and related methods | Emerging Cross-Sectional Technologies | 0 | Active |
| US7678751B2 | Composition for removing photoresist, method of removing photoresist and method of manufacturing a semiconductor device using the same | Chemistry; Metallurgy | 0 | Active |
| US7223721B2 | Resist and etching by-product removing composition and resist removing method using the same | Chemistry; Metallurgy | 0 | Expired |
| US7608540B2 | Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the composition | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.