Liquid crystal display device and method of manufacturing the same
US6433842B1 · kind B1 · utility
147Cited by
18References
33Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2000 |
| Grant date | Aug 13, 2002 |
| Priority date | — |
| Expiry date | Mar 29, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/13629
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The method of fabrication of a liquid crystal display device includes the steps of: forming a metal thin film on a glass substrate; forming a resist pattern on the metal thin film by photolithography; and wet-etching the metal thin film with an etchant formed of a mixture including phosphoric acid, nitric acid in a range between 7 mol % and 12 mol % inclusive, and at least one of ammonium fluoride and hydrogen fluoride in a trace amount of about 0.01 to 0.1 mol %.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.