Polymeric polishing pad having continuously regenerated work surface
US6439989B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 4, 1999 |
| Grant date | Aug 27, 2002 |
| Priority date | — |
| Expiry date | Aug 4, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31591
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
An article or polishing pad for altering a surface of a workpiece includes a polymeric matrix having a work surface and a subsurface proximate to the work surface. When the article is in contact with a working environment, the work surface is made relatively softer than the subsurface as a result of exposure to the working environment. As the work surface wears during use, the subsurface immediately adjacent to the work surface becomes exposed to the working environment and becomes the relatively softer work surface. As a result, the relatively softer work surface is continuously regenerated. In an alternative embodiment, an article for altering a surface of a workpiece includes a work surface having a texture, and the texture includes artifacts arranged in a fractal pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.