William D. Budinger
30Patents
19h-index
12Co-inventors
78Inventor score
Filing activity: May 19, 1976 → May 19, 2004
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4512113A | Workpiece holder for polishing operation | Performing Operations; Transporting | 582 | Expired |
| US5578362A | Polymeric polishing pad containing hollow polymeric microelements | Emerging Cross-Sectional Technologies | 239 | Expired |
| US4927432A | Pad material for grinding, lapping and polishing | Emerging Cross-Sectional Technologies | 139 | Expired |
| US5900164A | Method for planarizing a semiconductor device surface with polymeric pad containing hollow polymeric microelements | Emerging Cross-Sectional Technologies | 95 | Expired |
| US6022264A | Polishing pad and methods relating thereto | Performing Operations; Transporting | 67 | Expired |
| US6069080A | Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the like | Physics | 64 | Expired |
| US5932486A | Apparatus and methods for recirculating chemical-mechanical polishing of semiconductor wafers | Emerging Cross-Sectional Technologies | 56 | Expired |
| US6036579A | Polymeric polishing pad having photolithographically induced surface patterns(s) and methods relating thereto | Performing Operations; Transporting | 54 | Expired |
| US6099394A | Polishing system having a multi-phase polishing substrate and methods relating thereto | Physics | 47 | Expired |
| US6488570B1 | Method relating to a polishing system having a multi-phase polishing layer | Physics | 45 | Expired |
| US6210254A | Method of manufacturing a polymeric polishing pad having photolithographically induced surface pattern(s) | Performing Operations; Transporting | 39 | Expired |
| US4876903A | Method and apparatus for determination and display of critical gas supply information | Mechanical Engineering; Lighting; Heating | 37 | Expired |
| US6860793B2 | Window portion with an adjusted rate of wear | Performing Operations; Transporting | 37 | Expired |
| US4198739A | Printing roller with polymeric coner and method of making the same | Performing Operations; Transporting | 30 | Expired |
| US6517417B2 | Polishing pad with a transparent portion | Chemistry; Metallurgy | 28 | Expired |
| US6093649A | Polishing slurry compositions capable of providing multi-modal particle packing and methods relating thereto | Electricity | 25 | Expired |
| US6375559B1 | Polishing system having a multi-phase polishing substrate and methods relating thereto | Physics | 25 | Expired |
| US6439989B1 | Polymeric polishing pad having continuously regenerated work surface | Emerging Cross-Sectional Technologies | 21 | Expired |
| US6899611B2 | Polishing pad for a semiconductor device having a dissolvable substance | Emerging Cross-Sectional Technologies | 19 | Expired |
| US5384337A | Poromeric material having uniformly distributed electrets for maintaining an electrostatic charge | Chemistry; Metallurgy | 16 | Expired |
| US6030899A | Apparatus and methods for recirculating chemical-mechanical polishing of semiconductor wafers | Emerging Cross-Sectional Technologies | 16 | Expired |
| US6337281B1 | Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the like | Physics | 15 | Expired |
| US4970897A | Method and apparatus for determination and display of gas consumption time | Mechanical Engineering; Lighting; Heating | 11 | Expired |
| US5016483A | Method and apparatus for determination and display of critical gas supply information | Mechanical Engineering; Lighting; Heating | 10 | Expired |
| US6210525A | Apparatus and methods for chemical-mechanical polishing of semiconductor wafers | Physics | 10 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.