Projection exposure apparatus
US6441884B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 9, 2000 |
| Grant date | Aug 27, 2002 |
| Priority date | — |
| Expiry date | May 9, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical system for illumination is divided into a first optical system (10A) and a second optical system (10B). The second optical system (10B) is fixed to an exposure apparatus main body (SP). The exposure apparatus main body (SP) is provided to a base frame (41) via hard rubbers (31A and 32B) and piezo actuators (32A and 32B), and isolates vibration from the surface of the floor. The first optical system (10A) is supported separately from the exposure apparatus (SP) via actuators such as air mounts (14A and 14B) and voice coil motors (VCMs) (12A, 12B, 13A, and 13B) etc. A control system (50) compensates for the relative positional deviation between the first optical system (10A) and the second optical system (10B) detected by displacement sensors (26A and 26B) by controlling the position of the first optical system (10A) by driving the above described actuators.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.