Method to overcome image shortening by use of sub-resolution reticle features
US6451490B1 · kind B1 · utility
18Cited by
5References
21Claims
0Family size
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Key dates
| Filing date | Nov 8, 2000 |
| Grant date | Sep 17, 2002 |
| Priority date | — |
| Expiry date | Feb 16, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/32
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Image shortening in a photolithographic process is substantially reduced by using sub-resolution reticle features to alter the aerial image in the shortened regions. The use of such sub-resolution reticle features is simple to implement in a design system, and allows for increased feature aspect ratio as well as overlap to other critical features.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.