Polycyclic resist compositions with increased etch resistance
US6451499B1 · kind B1 · utility
8Cited by
4References
16Claims
0Family size
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Key dates
| Filing date | Jun 27, 2000 |
| Grant date | Sep 17, 2002 |
| Priority date | — |
| Expiry date | Jun 27, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negative tone resists.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.