Lithography apparatus
US6452662B2 · kind B2 · utility
114Cited by
49References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 6, 1999 |
| Grant date | Sep 17, 2002 |
| Priority date | — |
| Expiry date | Apr 6, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70108
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An illumination system for a microlithographic exposure apparatus comprised of an adjustable axicon, a variable zoom element, and a multipole illumination mode generating element. By controlling the optical components, the illumination mode can be varied continuously between conventional, annular, and multipole.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.