Method for producing coated workpieces, uses and installation for the method
US6454855B1 · kind B1 · utility
18Cited by
4References
88Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 13, 1999 |
| Grant date | Sep 24, 2002 |
| Priority date | — |
| Expiry date | Dec 13, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32018
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The method is characterized in that layers of sufficient quality for epitaxy are placed on workpieces, at a considerably increased deposition rate. To this end, instead of a UHV-CVD or ECR-CVD method, for example, a PECVD method is used by means of a DC plasma discharge.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.