Deposition reactor having vaporizing, mixing and cleaning capabilities

US6454860B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Craig Metzner · Fremont, US
• Turgut Sahin · Cupertino, US
• Gregory Redinbo · San Jose, US
• Pravin K. Narwankar · Sunnyvale, US
• Patricia M. Liu · Saratoga, US

Key dates

• Filing date: Oct 27, 1998
• Grant date: Sep 24, 2002
• Expiry date: Oct 27, 2018

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/54
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

An integrated deposition system is provided which is capable of vaporizing low vapor pressure liquid precursors and delivering this vapor into a processing region for use in the fabrication of advanced integrated circuits. The integrated deposition system is made up of a heated exhaust system, a remote plasma generator, a processing chamber and a liquid delivery system which together provide a commercially viable and production worthy system for depositing high capacity dielectric materials from low vapor pressure precursors, anneal those films while also providing commercially viable in-situ cleaning capability.