Method for measuring optical feature of exposure apparatus and exposure apparatus having means for measuring optical feature
US6456377B1 · kind B1 · utility
14Cited by
6References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 7, 1999 |
| Grant date | Sep 24, 2002 |
| Priority date | — |
| Expiry date | Dec 7, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70616
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A disclosed exposure apparatus comprises a photo-electric sensor having a light receiving portion supported by the substrate stage for a shifting movement within the shot area along the plane, a blind disposed between the light source and the project ion optical system and adapted to shield the illumination light reaching the shot area excluding an area surrounding the light receiving portion while the light receiving portion is being shifted along the plane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.