Methods for the lithographic deposition of materials containing nanoparticles
US6458431B2 · kind B2 · utility
32Cited by
4References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 30, 2001 |
| Grant date | Oct 1, 2002 |
| Priority date | — |
| Expiry date | Jul 30, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/105
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for depositing nanoparticles in a thin film through the dispersion of such nanoparticles in a precursor solution which is deposited on a substrate and converted into a metal or metal oxide film. The resulting metal or metal oxide film will contain embedded nanoparticles. Such films can be used in a variety of applications such as diffusion barriers, electrodes for capacitors, conductors, resistors, inductors, dielectrics, or magnetic materials. The nanoparticle material may be selected by one skilled in the art based on the particular application.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.