Method of polishing a memory or rigid disk with an ammonia-and/or halide-containing composition
US6461227B1 · kind B1 · utility
22Cited by
15References
22Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 17, 2000 |
| Grant date | Oct 8, 2002 |
| Priority date | — |
| Expiry date | Dec 1, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23F3/00
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A method for planarizing or polishing a memory or rigid disk is provided. The method comprises abrading at least a portion of the surface with a polishing system comprising (i) a polishing composition comprising water, an oxidizing agent, and a complexing agent selected from the group consisting of ammonia, halide ions, and mixtures thereof, and (ii) a polishing pad and/or an abrasive.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.