Mingming Fang
20Patents
7h-index
18Co-inventors
66Inventor score
Filing activity: Oct 22, 1999 → Mar 31, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6293848A | Composition and method for planarizing surfaces | Electricity | 41 | Expired |
| US6461227B1 | Method of polishing a memory or rigid disk with an ammonia-and/or halide-containing composition | Chemistry; Metallurgy | 22 | Expired |
| US7112123B2 | Chemical-mechanical polishing (CMP) slurry containing clay and CeO2 abrasive particles and method of planarizing surfaces | Electricity | 14 | Expired |
| US6976905B1 | Method for polishing a memory or rigid disk with a phosphate ion-containing polishing system | Chemistry; Metallurgy | 13 | Expired |
| US6468137B1 | Method for polishing a memory or rigid disk with an oxidized halide-containing polishing system | Chemistry; Metallurgy | 10 | Expired |
| US6527817B1 | Composition and method for planarizing surfaces | Electricity | 9 | Expired |
| US6471884B1 | Method for polishing a memory or rigid disk with an amino acid-containing composition | Physics | 9 | Expired |
| US6805812B2 | Phosphono compound-containing polishing composition and method of using same | Electricity | 6 | Expired |
| US6716755B2 | Composition and method for planarizing surfaces | Electricity | 5 | Expired |
| US6347978B1 | Composition and method for polishing rigid disks | Performing Operations; Transporting | 4 | Expired |
| US7087529B2 | Chemical-mechanical polishing (CMP) slurry and method of planarizing surfaces | Electricity | 4 | Expired |
| US6793559B2 | Composition and method for polishing rigid disks | Performing Operations; Transporting | 3 | Expired |
| US7267784B2 | Chemical-mechanical polishing (CMP) slurry and method of planarizing computer memory disk surfaces | Electricity | 2 | Active |
| US8916120B2 | Dry processes, apparatus, compositions and systems for reducing sulfur oxides and HCI | Mechanical Engineering; Lighting; Heating | 1 | Active |
| US7223156B2 | Method chemical-mechanical polishing and planarizing corundum, GaAs, GaP and GaAs/GaP alloy surfaces | Electricity | 0 | Expired |
| US11332387B2 | Removing arsenic from water with acid-activated clay | Chemistry; Metallurgy | 0 | Active |
| US11944952B2 | Removing contaminants from water with adsorbents | Chemistry; Metallurgy | 0 | Active |
| US10857186B2 | Traditional Chinese medicine composition for treating acute stage of cerebral infarction | Human Necessities | 0 | Active |
| US11332388B2 | Removal of selenium from water with kaolinite | Chemistry; Metallurgy | 0 | Active |
| US8992868B2 | Dry processes, apparatus compositions and systems for reducing mercury, sulfur oxides and HCl | Mechanical Engineering; Lighting; Heating | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.