Method of manufacturing mask using independent pattern data files
US6463577B1 · kind B1 · utility
6Cited by
5References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 4, 2000 |
| Grant date | Oct 8, 2002 |
| Priority date | — |
| Expiry date | May 4, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70433
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There are independently made data of a device pattern, an identification and scribe pattern including a scribe pattern surrounding the device pattern, identification patterns formed in a scribe region indicated by the scribe pattern and outer periphery of the scribe region, and an outer peripheral pattern formed outside the scribe region except the identification pattern. From the data, data for an exposure system or a mask inspection apparatus are produced. The outer peripheral pattern is divided into a plurality of patterns each is a unit of a exposure region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.