Taketoshi Omata
4Patents
2h-index
11Co-inventors
37Inventor score
Filing activity: May 4, 2000 → Aug 31, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6463577B1 | Method of manufacturing mask using independent pattern data files | Physics | 6 | Expired |
| US6800428B2 | Wavelength-independent exposure pattern generation method and exposure pattern generation system for lithography | Physics | 3 | Expired |
| US7907771B2 | Pattern data processing system, pattern data processing method, and pattern data processing program | Physics | 0 | Active |
| US7331025B2 | Data storage method and data storage device | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.