Substrate processing apparatus including a magnetically levitated and rotated substrate holder
US6464825B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 15, 2000 |
| Grant date | Oct 15, 2002 |
| Priority date | — |
| Expiry date | Jul 24, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4584
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate processing apparatus includes a substrate processing chamber; a mechanism for long and unloading a substrate into and out of the chamber; a substrate heating source provided in the chamber; and a raw material supply source for supplying a raw material toward the substrate for processing. During processing of the substrate, the raw material for processing is supplied from a surface facing a surface of the substrate to be processed. When the substrate and a holder on which the substrate is placed are moved to a predetermined position for processing in the substrate processing chamber, a space in the substrate processing chamber is divided by the substrate into an upper space serving as a reaction space for processing and a lower space where the substrate heating source, etc. are placed. The apparatus also includes a magnetic force source for holding the holder at the predetermined position in a levitational manner by a magnetic force during processing of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.