Ozone processing apparatus for semiconductor processing system
US6464948B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 26, 2001 |
| Grant date | Oct 15, 2002 |
| Priority date | — |
| Expiry date | Jan 26, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/40
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An ozone processing apparatus for a semiconductor processing system includes an ozone generating unit and a reforming processing unit connected to each other through a connection piping section. The ozone generating unit includes an ozone generator and a pressure regulator connected to each other through a piping line. The connection piping section has a double-pipe structure consisting of an inner pipe and an outer pipe. The piping line and the inner pipe are made of a fluorocarbon resin. A branch line branches from the middle of the piping line, and is connected to a factory exhaust passageway. The branch line is provided with a flowmeter and an ozone densitometer. A controller is arranged to control the ozone generator with reference to the value of ozone concentration measured by the densitometer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.